Moreover, SEM emulation is applied for resist model calibration to capture subtle error signatures through dose and defocus. Finally, it should be noted that our SEM emulation methodology is based on the approximation of physical phenomena which are taking place in real SEM image formation. This approximation allows achieving better speed performance compared to a fully physical model. |
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Scanning electron microscopy
Calibration
Critical dimension metrology
Metrology
Electron beams
Lithography
3D modeling