Development of high coherence high power 193nm laser

Satoshi Tanaka; Masaki Arakawa; Atsushi Fuchimukai; Yoichi Sasaki; Takashi Onose; Yasuhiro Kamba; Hironori Igarashi; Chen Qu; Mitsuru Tamiya; Hiroaki Oizumi; Shinji Ito; Koji Kakizaki; Hongwen Xuan; Zhigang Zhao; Yohei Kobayashi; Hakaru Mizoguchi

doi:10.1117/12.2211210

16 March 2016 Development of high coherence high power 193nm laser

Satoshi Tanaka, Masaki Arakawa, Atsushi Fuchimukai, Yoichi Sasaki, Takashi Onose, Yasuhiro Kamba, Hironori Igarashi, Chen Qu, Mitsuru Tamiya, Hiroaki Oizumi, Shinji Ito, Koji Kakizaki, Hongwen Xuan, Zhigang Zhao, Yohei Kobayashi, Hakaru Mizoguchi

Author Affiliations +

Proceedings Volume 9726, Solid State Lasers XXV: Technology and Devices; 972624 (2016) https://doi.org/10.1117/12.2211210
Event: SPIE LASE, 2016, San Francisco, California, United States

Abstract

We have been developing a hybrid 193 nm ArF laser system that consists of a solid state seeding laser and an ArF excimer laser amplifier for power-boosting. The solid state laser consists of an Yb-fiber-solid hybrid laser system and an Er-fiber laser system as fundamentals, and one LBO and three CLBO crystals for frequency conversion. In an ArF power amplifier, the seed laser passes through the ArF gain media three times, and an average power of 110 W is obtained. As a demonstration of the potential applications of the laser, an interference exposure test is performed.

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Satoshi Tanaka, Masaki Arakawa, Atsushi Fuchimukai, Yoichi Sasaki, Takashi Onose, Yasuhiro Kamba, Hironori Igarashi, Chen Qu, Mitsuru Tamiya, Hiroaki Oizumi, Shinji Ito, Koji Kakizaki, Hongwen Xuan, Zhigang Zhao, Yohei Kobayashi, and Hakaru Mizoguchi "Development of high coherence high power 193nm laser", Proc. SPIE 9726, Solid State Lasers XXV: Technology and Devices, 972624 (16 March 2016); https://doi.org/10.1117/12.2211210

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