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Proceedings Article

Approach to hp10nm resolution by applying Dry Development Rinse Process (DDRP) and Materials (DDRM)

[+] Author Affiliations
Wataru Shibayama, Shuhei Shigaki, Satoshi Takeda, Ryuji Onishi, Makoto Nakajima, Rikimaru Sakamoto

Nissan Chemical Industries, Ltd. (Japan)

Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 977609 (March 18, 2016); doi:10.1117/12.2219475
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From Conference Volume 9776

  • Extreme Ultraviolet (EUV) Lithography VII
  • Eric M. Panning; Kenneth A. Goldberg
  • San Jose, California, United States | February 21, 2016

abstract

EUV lithography has been desired as the leading technology for single nm half-pitch patterning. However, the source power, masks and resist materials still have critical issues for mass production. Especially in resist materials, RLS trade-off is the key issue. To overcome this issue, we are suggesting Dry Development Rinse Process (DDRP) and Materials (DDRM) as the pattern collapse mitigation approach. This DDRM can perform not only as pattern collapse free materials for fine pitch, but also as the etching hard mask against bottom layer (spin on carbon : SOC). In this paper, we especially propose new approaches to achieve high resolution around hp10nm. The key points of our concepts are 1) control PR profiles, 2) new solvent system to avoid chemical mixture, 3) high etching selective DDR materilas and 4) high planar DDR materials. This new DDRM technology can be the promising approach for hp10nm level patterning in N7/N5 and beyond. © (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation

Wataru Shibayama ; Shuhei Shigaki ; Satoshi Takeda ; Ryuji Onishi ; Makoto Nakajima, et al.
" Approach to hp10nm resolution by applying Dry Development Rinse Process (DDRP) and Materials (DDRM) ", Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 977609 (March 18, 2016); doi:10.1117/12.2219475; http://dx.doi.org/10.1117/12.2219475


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