NXE pellicle: offering a EUV pellicle solution to the industry

Derk Brouns; Aage Bendiksen; Par Broman; Eric Casimiri; Paul Colsters; Peter Delmastro; Dennis de Graaf; Paul Janssen; Mark van de Kerkhof; Ronald Kramer; Matthias Kruizinga; Henk Kuntzel; Frits van der Meulen; David Ockwell; Maria Peter; Daniel Smith; Beatrijs Verbrugge; David van de Weg; Jim Wiley; Noelie Wojewoda; Carmen Zoldesi; Pieter van Zwol

doi:10.1117/12.2221909

18 March 2016 NXE pellicle: offering a EUV pellicle solution to the industry

Derk Brouns, Aage Bendiksen, Par Broman, Eric Casimiri, Paul Colsters, Peter Delmastro, Dennis de Graaf, Paul Janssen, Mark van de Kerkhof, Ronald Kramer, Matthias Kruizinga, Henk Kuntzel, Frits van der Meulen, David Ockwell, Maria Peter, Daniel Smith, Beatrijs Verbrugge, David van de Weg, Jim Wiley, Noelie Wojewoda, Carmen Zoldesi, Pieter van Zwol

Author Affiliations +

Proceedings Volume 9776, Extreme Ultraviolet (EUV) Lithography VII; 97761Y (2016) https://doi.org/10.1117/12.2221909
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

Towards the end of 2014, ASML committed to provide a EUV pellicle solution to the industry. Last year, during SPIE Microlithography 2015, we introduced the NXE pellicle concept, a removable pellicle solution that is compatible with current and future patterned mask inspection methods. This paper shows results of how we took this concept to a complete EUV pellicle solution for the industry. We will highlight some technical design challenges we faced developing the NXE pellicle and how we solved them. We will also present imaging results of pellicle exposures on a 0.33 NA NXE scanner system. In conjunction with the NXE pellicle, we will also present the supporting tooling we have developed to enable pellicle use.

Citation Download Citation

Derk Brouns, Aage Bendiksen, Par Broman, Eric Casimiri, Paul Colsters, Peter Delmastro, Dennis de Graaf, Paul Janssen, Mark van de Kerkhof, Ronald Kramer, Matthias Kruizinga, Henk Kuntzel, Frits van der Meulen, David Ockwell, Maria Peter, Daniel Smith, Beatrijs Verbrugge, David van de Weg, Jim Wiley, Noelie Wojewoda, Carmen Zoldesi, and Pieter van Zwol "NXE pellicle: offering a EUV pellicle solution to the industry", Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97761Y (18 March 2016); https://doi.org/10.1117/12.2221909

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