Investigation of coat-develop track system for placement error of contact hole shrink process

Masahiko Harumoto; Harold Stokes; Yuji Tanaka; Koji Kaneyama; Charles Pieczulewski; Masaya Asai; Isabelle Servin; Maxime Argoud; Ahmed Gharbi; Celine Lapeyre; Raluca Tiron; Cedric Monget

doi:10.1117/12.2219925

1 April 2016 Investigation of coat-develop track system for placement error of contact hole shrink process

Masahiko Harumoto, Harold Stokes, Yuji Tanaka, Koji Kaneyama, Charles Pieczulewski, Masaya Asai, Isabelle Servin, Maxime Argoud, Ahmed Gharbi, Celine Lapeyre, Raluca Tiron, Cedric Monget

Author Affiliations +

Proceedings Volume 9777, Alternative Lithographic Technologies VIII; 97770O (2016) https://doi.org/10.1117/12.2219925
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

Directed Self-Assembly (DSA) is a well-known candidate for next generation sub-15nm half-pitch lithography. ^[1-2] DSA processes on 300mm wafers have been demonstrated for several years, and have given a strong impression due to finer pattern results. ^[3-4] On t he other hand, specific issues with DSA processes have begun to be clear as a result of these recent challenges. ^[5-6] Pattern placement error, which means the pattern shift after DSA fabrication, is recognized as one of these typical issues. Coat-Develop Track systems contribute to the DSA pattern fabrication and also influence the DSA pattern performance.^[4] In this study, the placement error was investigated using a simple contact-hole pattern and subsequent contact-hole shrink process implemented on the SOKUDO DUO track. Thus, we will show the placement error of contact-hole shrink using a DSA process and discuss the difference between DSA and other shrink methods.

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Masahiko Harumoto, Harold Stokes, Yuji Tanaka, Koji Kaneyama, Charles Pieczulewski, Masaya Asai, Isabelle Servin, Maxime Argoud, Ahmed Gharbi, Celine Lapeyre, Raluca Tiron, and Cedric Monget "Investigation of coat-develop track system for placement error of contact hole shrink process", Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 97770O (1 April 2016); https://doi.org/10.1117/12.2219925

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