Paper
25 March 2016 Phase field mapping for accurate, ultrafast simulations of directed self-assembly
Jimmy Liu, Kris T. Delaney, Glenn H. Fredrickson
Author Affiliations +
Abstract
Block copolymer self-assembly is a powerful tool for nanoscale patterning which benefits from predictive simulations. Two classes of simulations are self-consistent field theory (SCFT), which is accurate but computationally expensive, and phase field models, which are faster but historically less accurate. We refine a mapping procedure that uses results from SCFT to optimize parameters in a phase field model for diblock copolymers. We validate the performance of this optimized phase field model with regards to accuracy and computational speed in perfect and defective configurations. The optimized phase field model is significantly faster than SCFT and more accurate than previous phase field models, making it a viable design tool for directed self-assembly processes.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jimmy Liu, Kris T. Delaney, and Glenn H. Fredrickson "Phase field mapping for accurate, ultrafast simulations of directed self-assembly", Proc. SPIE 9779, Advances in Patterning Materials and Processes XXXIII, 977920 (25 March 2016); https://doi.org/10.1117/12.2219311
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Performance modeling

Systems modeling

Directed self assembly

Optical lithography

Process modeling

Computer simulations

Polymers

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