Structure of Ru/B4C multilayer for high-flux monochromator application

Yang Liu; Qiushi Huang; Hui Jiang; Yang Yang; Zhong Zhang; Zhanshan Wang

doi:10.1117/12.2236627

15 September 2016 Structure of Ru/B₄C multilayer for high flux monochromator application

Yang Liu, Qiushi Huang, Hui Jiang, Yang Yang, Zhong Zhang, Zhanshan Wang

Proceedings Volume 9963, Advances in X-Ray/EUV Optics and Components XI; 99630H (2016) https://doi.org/10.1117/12.2236627
Event: SPIE Optical Engineering + Applications, 2016, San Diego, California, United States

Abstract

Multilayer monochromators are widely needed in synchrotron beamlines to provide the high photon flux as compared to crystals. Ru/B4C multilayer is the most promising candidate working at the energy region of 10-20 keV. To develop this multilayer monochromator for an undulator beamline with high power density, the layer structure and reflectivity of the multilayer were studied. The deposition process for the Ru/B₄C multilayers was first optimized. Multilayers with different periods (d=2.0 nm, 3.0 nm, 4.0 nm) and single layers fo Ru and B4C were fabricated and characterized using the grazing incidence X-ray reflectometry (GIXR). A low density of Ru in the multilayers was found as compared to the single layers which attributed to the relatively low reflectance of 53.3% at 8.05 keV of the multilayer with 3.0 nm period.

Citation Download Citation

Yang Liu, Qiushi Huang, Hui Jiang, Yang Yang, Zhong Zhang, and Zhanshan Wang "Structure of Ru/B₄C multilayer for high flux monochromator application", Proc. SPIE 9963, Advances in X-Ray/EUV Optics and Components XI, 99630H (15 September 2016); https://doi.org/10.1117/12.2236627

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