Mechanical stress induced by external forces in the extreme ultraviolet pellicle

Hyun-Ju Lee; Eun-Sang Park; In-Seon Kim; Hye-Keun Oh

doi:10.1117/12.2242174

4 October 2016 Mechanical stress induced by external forces in the extreme ultraviolet pellicle

Hyun-Ju Lee, Eun-Sang Park, In-Seon Kim, Hye-Keun Oh

Proceedings Volume 9985, Photomask Technology 2016; 99851K (2016) https://doi.org/10.1117/12.2242174
Event: SPIE Photomask Technology, 2016, San Jose, California, United States

Abstract

EUV pellicle with very thin thickness is significantly affected when external forces are applied. The mechanical forces such as chamber-pellicle pressure difference and stage acceleration cause the mechanical stress in pellicle. We investigated the maximum stress that can be induced by the pressure difference for various materials by using finite element method (FEM). We also used theoretical model and FEM for predicting the pellicle deformation. Our results show the mechanical deformation and the stress of full size (152 × 120 mm²) pellicle with 50 nm thickness, and the influence of the pellicle is increased with larger pressure difference. We also studied the maximum stress caused by the acceleration force of the scanner. The full size pellicle is greatly influenced with the specific pulse width causing resonance. Our study indicates that mechanical stress with acceleration is very small and can be ignored.

Citation Download Citation

Hyun-Ju Lee, Eun-Sang Park, In-Seon Kim, and Hye-Keun Oh "Mechanical stress induced by external forces in the extreme ultraviolet pellicle", Proc. SPIE 9985, Photomask Technology 2016, 99851K (4 October 2016); https://doi.org/10.1117/12.2242174

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