Measurement of aspheric mirror by nanoprofiler using normal vector tracing

Takao Kitayama; Hiroki Shiraji; Kazuya Yamamura; Katsuyoshi Endo

doi:10.1117/12.2242408

12 October 2016 Measurement of aspheric mirror by nanoprofiler using normal vector tracing

Takao Kitayama, Hiroki Shiraji, Kazuya Yamamura, Katsuyoshi Endo

Proceedings Volume 9962, Advances in Metrology for X-Ray and EUV Optics VI; 99620B (2016) https://doi.org/10.1117/12.2242408
Event: SPIE Optical Engineering + Applications, 2016, San Diego, California, United States

Abstract

Aspheric or free-form optics with high accuracy are necessary in many fields such as third-generation synchrotron radiation and extreme-ultraviolet lithography. Therefore the demand of measurement method for aspherical or free-form surface with nanometer accuracy increases. Purpose of our study is to develop a non-contact measurement technology for aspheric or free-form surfaces directly with high repeatability. To achieve this purpose we have developed threedimensional Nanoprofiler which detects normal vectors of sample surface. The measurement principle is based on the straightness of laser light and the accurate motion of rotational goniometers. This machine consists of four rotational stages, one translational stage and optical head which has the quadrant photodiode (QPD) and laser source. In this measurement method, we conform the incident light beam to reflect the beam by controlling five stages and determine the normal vectors and the coordinates of the surface from signal of goniometers, translational stage and QPD. We can obtain three-dimensional figure from the normal vectors and their coordinates by surface reconstruction algorithm. To evaluate performance of this machine we measure a concave aspheric mirror with diameter of 150 mm. As a result we achieve to measure large area of 150mm diameter. And we observe influence of systematic errors which the machine has. Then we simulated the influence and subtracted it from measurement result.

Citation Download Citation

Takao Kitayama, Hiroki Shiraji, Kazuya Yamamura, and Katsuyoshi Endo "Measurement of aspheric mirror by nanoprofiler using normal vector tracing", Proc. SPIE 9962, Advances in Metrology for X-Ray and EUV Optics VI, 99620B (12 October 2016); https://doi.org/10.1117/12.2242408

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
7 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Error analysis

Mirrors

Aspheric lenses

Head

Aspheric optics

Optical components

Extreme ultraviolet lithography

Show All Keywords

Keywords/Phrases

Search In:

Publication Years