MBMW-101: World's 1st high-throughput multi-beam mask writer

Christof Klein; Elmar Platzgummer

doi:10.1117/12.2243638

25 October 2016 MBMW-101: World's 1st high-throughput multi-beam mask writer

Christof Klein, Elmar Platzgummer

Proceedings Volume 9985, Photomask Technology 2016; 998505 (2016) https://doi.org/10.1117/12.2243638
Event: SPIE Photomask Technology, 2016, San Jose, California, United States

Abstract

The world’s first high throughput multi-beam mask writers (MBMW) have been realized by upgrading the existing MBMW Alpha and Beta tools with a 10x faster data path. In these tools a multi-beam column provides 262-thousand programmable beams of 20nm beam size. The current density is adjustable up to 1 A/cm², resulting in a total beam current of up to 1 μA. With the upgraded 120 Gbps data path full field 7nm node layouts can be printed in less than 10 hours. This upgrade completes IMS’ first generation of multi-beam mask writers, which is called MBMW-101 and is meeting the requirements of the 7nm technology node.

Citation Download Citation

Christof Klein and Elmar Platzgummer "MBMW-101: World's 1st high-throughput multi-beam mask writer", Proc. SPIE 9985, Photomask Technology 2016, 998505 (25 October 2016); https://doi.org/10.1117/12.2243638

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