Introducing the EUV CNT pellicle

Jae Uk Lee; Johannes Vanpaemel; Ivan Pollentier; Christoph Adelmann; Houman Zahedmanesh; Cedric Huyghebaert; Marina Timmermans; Michael De Volder; Emily Gallagher

doi:10.1117/12.2243019

25 October 2016 Introducing the EUV CNT pellicle

Jae Uk Lee, Johannes Vanpaemel, Ivan Pollentier, Christoph Adelmann, Houman Zahedmanesh, Cedric Huyghebaert, Marina Timmermans, Michael De Volder, Emily Gallagher

Author Affiliations +

Proceedings Volume 9985, Photomask Technology 2016; 99850C (2016) https://doi.org/10.1117/12.2243019
Event: SPIE Photomask Technology, 2016, San Jose, California, United States

Abstract

EUV lithography insertion is anticipated at the 7 nm node and below; however, defects added to the mask during use is a lingering concern. Defectivity in the scanner is non-zero and an EUV pellicle membrane to protect the mask for high volume manufacturing power levels does not yet exist. The EUV photons are strongly absorbed by all materials. Sibased membranes leverage the low absorption coefficient k value (k = 0.0018 at 13.5 nm) for reasonable transmission, but poly Si becomes fragile and wrinkles during the high temperatures associated with exposure. An alternate approach to high transmission is deploying very thin or porous layers so that there are fewer atoms to absorb light. For example, carbon nanomaterials have a reasonably low k value (k = 0.0069), but are strong enough to be fabricated in very thin layers. Graphene, graphite, carbon-nanosheets and carbon nanotubes are all candidate carbon nanomaterials for this application, but we focus here on carbon nanotubes (CNTs). Our first measurements on CNT films of ~60 nm thick were found to have 96.5% transmission at 13.5 nm. Adding CNT layers also enhanced the strength of a thin SiN membrane significantly. In this paper, critical pellicle metrics will be evaluated in more detail: EUV transmission, bulge test for mechanical strength, emissivity measurements for heat management, and exposure testing in a hydrogen environment.

Citation Download Citation

Jae Uk Lee, Johannes Vanpaemel, Ivan Pollentier, Christoph Adelmann, Houman Zahedmanesh, Cedric Huyghebaert, Marina Timmermans, Michael De Volder, and Emily Gallagher "Introducing the EUV CNT pellicle", Proc. SPIE 9985, Photomask Technology 2016, 99850C (25 October 2016); https://doi.org/10.1117/12.2243019

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available