Reticle inspection equipment productivity increase using SEMI specification for reticle and pod management

Ron Taylor; Jack Downey; Jeffrey Wood; Yen-Hung Lin; Bharathi Bugata; Dongsheng Fan; Carl Hess; Mark Wylie

doi:10.1117/12.2241129

25 October 2016 Reticle inspection equipment productivity increase using SEMI specification for reticle and pod management

Ron Taylor, Jack Downey, Jeffrey Wood, Yen-Hung Lin, Bharathi Bugata, Dongsheng Fan, Carl Hess, Mark Wylie

Author Affiliations +

Proceedings Volume 9985, Photomask Technology 2016; 99850L (2016) https://doi.org/10.1117/12.2241129
Event: SPIE Photomask Technology, 2016, San Jose, California, United States

Abstract

In this work, the SEMI specification for reticle and pod management (E109) with internal reticle library support has been integrated for the first time on KLA-Tencor’s Teron^TM and TeraScan^TM reticle inspection tools. Manufacturing Execution System scheduling reticle jobs and Automated Material Handling System scheduling to transfer pods simultaneously have also been integrated and tested. GLOBALFOUNDRIES collaboratively worked with KLA-Tencor to successfully implement these capabilities. Both library and non-library scenarios have been demonstrated for comparison in a real production environment resulting in productivity increase of approximately 29% by making use of the library. Reticle re-qualification test cases were used for the comparison in this work.

Citation Download Citation

Ron Taylor, Jack Downey, Jeffrey Wood, Yen-Hung Lin, Bharathi Bugata, Dongsheng Fan, Carl Hess, and Mark Wylie "Reticle inspection equipment productivity increase using SEMI specification for reticle and pod management", Proc. SPIE 9985, Photomask Technology 2016, 99850L (25 October 2016); https://doi.org/10.1117/12.2241129

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