Method for ion beam etching in angles with multi-layers model

Siwei Zeng; Lixiang Wu; Keqiang Qiu; Zhengkun Liu; Yilin Hong; Shaojun Fu

doi:10.1117/12.2242280

28 October 2016 Method for ion beam etching in angles with multi-layers model

Siwei Zeng, Lixiang Wu, Keqiang Qiu, Zhengkun Liu, Yilin Hong, Shaojun Fu

Proceedings Volume 9683, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 96830L (2016) https://doi.org/10.1117/12.2242280
Event: Eighth International Symposium on Advanced Optical Manufacturing and Testing Technology (AOMATT2016), 2016, Suzhou, China

Abstract

A new method for controlling the groove profiles of diffraction gratings which changes the etching angle and etching time, meanwhile divides the etching area in the substrate into multi-layers to have a good approximation for the theory is introduced. We put forward a multi-layers etching model on the base of the ion bean sputtering (IBS) which can calculate the etching time and etching angle. We test the curved grooves profiles and get the optimizations for the number of the multi-layers, etching time and etching time in this model. Also a photoresist grating is applied for the etching experiment. The results indicate that the optimized parameters such as the number of the multi-layers result in a smaller root mean square deviation (RMSD) between the theory and the real etching result which show good agreement with the theoretical groove within the variation of ±6% of the etching rate. The simulation predictions and experimental results show that the multi-layers etching model to control the groove profiles of diffraction gratings is available.

Citation Download Citation

Siwei Zeng, Lixiang Wu, Keqiang Qiu, Zhengkun Liu, Yilin Hong, and Shaojun Fu "Method for ion beam etching in angles with multi-layers model", Proc. SPIE 9683, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 96830L (28 October 2016); https://doi.org/10.1117/12.2242280

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KEYWORDS

Etching

Ion beams

Photoresist materials

Diffraction gratings

Monte Carlo methods

Sputter deposition

Lithium

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