Effects of chemical etching on the surface quality and the laser induced damage threshold of fused silica optics

Mathilde Pfiffer; Philippe Cormont; Jérôme Néauport; Sébastien Lambert; Evelyne Fargin; Bruno Bousquet; Marc Dussauze

doi:10.1117/12.2244972

6 December 2016 Effects of chemical etching on the surface quality and the laser induced damage threshold of fused silica optics

Mathilde Pfiffer, Philippe Cormont, Jérôme Néauport, Sébastien Lambert, Evelyne Fargin, Bruno Bousquet, Marc Dussauze

Author Affiliations +

Proceedings Volume 10014, Laser-Induced Damage in Optical Materials 2016; 1001405 (2016) https://doi.org/10.1117/12.2244972
Event: SPIE Laser Damage, 2016, Boulder, Colorado, United States

Abstract

Effects of deep wet etching on the surface quality and the laser induced damage probability have been studied on fused silica samples. Results obtained with a HF/HNO₃ solution and a KOH solution were compared on both polished pristine surface and scratched surfaces. The hydrofluoric solution radically deteriorated the surface quality creating a haze on the whole surface and increasing considerably the roughness. For both solutions, neither improvement nor deterioration of the laser damage performances has been observed on the etched surfaces while the laser damage resistance of scratches has been increased to the level of the surface. We conclude that laser damage performances are equivalent with both solutions but an acid etching induces surface degradation that is not experienced with basic etching.

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Mathilde Pfiffer, Philippe Cormont, Jérôme Néauport, Sébastien Lambert, Evelyne Fargin, Bruno Bousquet, and Marc Dussauze "Effects of chemical etching on the surface quality and the laser induced damage threshold of fused silica optics", Proc. SPIE 10014, Laser-Induced Damage in Optical Materials 2016, 1001405 (6 December 2016); https://doi.org/10.1117/12.2244972

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