Cellular-automata model of oxygen plasma impact on porous low-K dielectric

Askar Rezvanov; Igor V. Matyushkin; Oleg P. Gutshin; Evgeny S. Gornev

doi:10.1117/12.2266626

30 December 2016 Cellular-automata model of oxygen plasma impact on porous low-K dielectric

Askar Rezvanov, Igor V. Matyushkin, Oleg P. Gutshin, Evgeny S. Gornev

Proceedings Volume 10224, International Conference on Micro- and Nano-Electronics 2016; 102241X (2016) https://doi.org/10.1117/12.2266626
Event: The International Conference on Micro- and Nano-Electronics 2016, 2016, Zvenigorod, Russian Federation

Abstract

Cellular-automata model of oxygen plasma influence on the integral properties of porous low-K dielectric is studied. The present work investigates the imitative simulation of this process. In our model we consider one isolated pore, which is simulated by cylinder with length L=200 nm and radius 1 nm ignoring the curvature factor. The simulation was performed for 2 million automata steps that correspond to 2 seconds in the real process time. Extrapolating the data to the longer time shows that more and more •CH₃ groups will be replaced by the •OH groups, and over time almost all methyl groups will leave the pore surface (there is not more than 20% of the initial methyl groups amount on the first low-K dielectric 40nm after 2 seconds simulation).

Citation Download Citation

Askar Rezvanov, Igor V. Matyushkin, Oleg P. Gutshin, and Evgeny S. Gornev "Cellular-automata model of oxygen plasma impact on porous low-K dielectric", Proc. SPIE 10224, International Conference on Micro- and Nano-Electronics 2016, 102241X (30 December 2016); https://doi.org/10.1117/12.2266626

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