Paper
16 February 2017 An innovative single development process for integrated optical Mach-Zehnder interferometer pattern transfer
NurulBariah Idris, Kuen Yau Lau, Kang Nan Khor, Mohamad Halim Abdul Wahid, Nor Azura Malini Ahmad Hambali, Vithyacharan Retnasamy, Mukhzeer Mohamad Shahimin
Author Affiliations +
Proceedings Volume 10100, Optical Components and Materials XIV; 1010027 (2017) https://doi.org/10.1117/12.2257054
Event: SPIE OPTO, 2017, San Francisco, California, United States
Abstract
Integrated optical Mach-Zehnder interferometer (IO-MZI) has been widely researched for various usage including for biosensor application. However, the success rate of IO-MZI pattern transfer has been low using the conventional multidevelopment process. One of the main factors is the particle contamination due to the practice of reused developer bath. In this work, an innovative single development process had been proposed with the utilization of the same conventional set-up but with a different protocol. The concept of this method is the estimation of total development time based on the calculated development rate. By doing so, the development process can be completed with only one immersion of the substrate in the developer bath. Besides, the manipulation of development rate by varying exposure time in this work also had revealed the possibility of manipulation of line-width based on the exposure time. In short, the proposed single development process has increased the success rate of IO-MZI pattern transfer from 30% (multi-development method) to 90%.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
NurulBariah Idris, Kuen Yau Lau, Kang Nan Khor, Mohamad Halim Abdul Wahid, Nor Azura Malini Ahmad Hambali, Vithyacharan Retnasamy, and Mukhzeer Mohamad Shahimin "An innovative single development process for integrated optical Mach-Zehnder interferometer pattern transfer", Proc. SPIE 10100, Optical Components and Materials XIV, 1010027 (16 February 2017); https://doi.org/10.1117/12.2257054
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KEYWORDS
Photoresist developing

Integrated optics

Mach-Zehnder interferometers

Biosensors

Photoresist materials

Optical fabrication equipment

Optical lithography

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