Paper
8 March 2017 Industrialization progress of high-purity hafnium for optical components
Lijun Wang, Shunli Zhang, Jiandong Zhang, Yang Chen, Jiaqing Peng
Author Affiliations +
Proceedings Volume 10255, Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016; 1025512 (2017) https://doi.org/10.1117/12.2266456
Event: Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016, 2016, Jinhua, Suzhou, Chengdu, Xi'an, Wuxi, China
Abstract
Hafnium oxide, hafnium crystal bar and high-purity hafnium were prepared using extraction separation, reduction, electrolytic refining, iodide refining and electron beam melting process by General Research Institute for Nonferrous Metals. A hundreds-kilogram production line has been built. The purity of the high-purity hafnium was Zr/(Zr+Hf) <0.3wt% and Zr+Hf>99.99wt%, which enables a high laser induced damage threshold.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lijun Wang, Shunli Zhang, Jiandong Zhang, Yang Chen, and Jiaqing Peng "Industrialization progress of high-purity hafnium for optical components", Proc. SPIE 10255, Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016, 1025512 (8 March 2017); https://doi.org/10.1117/12.2266456
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KEYWORDS
Hafnium

Metals

Laser damage threshold

Laser induced damage

Crystals

Oxides

Iron

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