Investigation of the chemical composition and atomic emission spectroscopy of fused silica in CF4 plasma processing

Huiliang Jin; Caixue Tang; Nan Zheng; Wenhui Deng; Xianhua Chen

doi:10.1117/12.2266534

8 March 2017 Investigation of the chemical composition and atomic emission spectroscopy of fused silica in CF₄ plasma processing

Huiliang Jin, Caixue Tang, Nan Zheng, Wenhui Deng, Xianhua Chen

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Proceedings Volume 10255, Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016; 1025515 (2017) https://doi.org/10.1117/12.2266534
Event: Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016, 2016, Jinhua, Suzhou, Chengdu, Xi'an, Wuxi, China

Abstract

The surface chemical composition and atomic emission spectroscopy of F atoms and CF₂ molecules involved in the processing of Atmospheric Pressure Plasma Jet (APPJ) produced from CF₄ precursor has been explored. The XPS spectra illustrated that small amount of radicals including C-CF_nand CF-CF_n could be introduced onto the fused silica surface during the CF₄plasma process, the fluorocarbon radicals were generated during CF₄plasma ionization. Moreover, the relative concentrations of excited state species of F atoms and CF₂ molecules, which play significant role in remove and fluorocarbon radicals, were acquired for CF₄plasma. The densities of F atoms increased dramatically with increasing applied RF power, whereas CF₂molecules decreased monotonically over the same power range, the subsequent electron impacted decomposition of plasma species after CF₄ precursor fragmentation. The spectrum of the F atoms and CF₂ molecules fallowed the same tendency with the increasing concentration of gas CF₄, reaching the maximum at the 20sccm and 15sccm respectively, and then the emission intensity of reactive atoms decreased with more CF₄ molecules participating. Addition certain amount O₂into CF₄ plasma resulted in promoting CF₄dissociation, O₂can easily react with the dissociation product of CF₂molecules, which inhibit the compound of the F atoms, so with the increasing concentration of O₂, the concentration of the CF₂molecules decreased and the emission intensities of F atoms showed the maximum at the O₂/CF₄ratio of 20%. These results have led to the development of a scheme that illustrates the mechanisms of surface chemistry reaction and the affection of plasma parameters in CF₄plasma systems with respect to F and CF₂ gas-phase species.

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Huiliang Jin, Caixue Tang, Nan Zheng, Wenhui Deng, and Xianhua Chen "Investigation of the chemical composition and atomic emission spectroscopy of fused silica in CF₄ plasma processing", Proc. SPIE 10255, Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016, 1025515 (8 March 2017); https://doi.org/10.1117/12.2266534

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KEYWORDS

Plasma

Chemical species

Molecules

Fluorine

Silica

Emission spectroscopy

Atmospheric plasma

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