Plasma-assisted thermal atomic layer etching of Al2O3

Andreas Fischer; Richard Janek; John Boniface; Thorsten Lill; K. J. Kanarik; Yang Pan; Vahid Vahedi; Richard A. Gottscho

doi:10.1117/12.2258129

21 March 2017 Plasma-assisted thermal atomic layer etching of Al₂O₃

Andreas Fischer, Richard Janek, John Boniface, Thorsten Lill, K. J. Kanarik, Yang Pan, Vahid Vahedi, Richard A. Gottscho

Author Affiliations +

Proceedings Volume 10149, Advanced Etch Technology for Nanopatterning VI; 101490H (2017) https://doi.org/10.1117/12.2258129
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

In this paper, we report on plasma assisted thermal Atomic Layer Etching (ALE) of Al₂O₃. The surface was modified via a fluorine containing plasma without bias power. The removal was accomplished by a thermal reaction step using tin-(II) acetylacetonate Sn(acac)₂. After a few cycles, material removal stopped and growth of a Sn-containing layer was observed. Insertion of a hydrogen plasma step was found to remove the Sn layer and a continuous material removal of 0.5 Å/cycle was measured. The results show that plasma assistance can be used to realize thermal ALE of Al₂O₃. Specifically, plasma can be used both in the fluorination step and to keep the surface free from contaminations.

Citation Download Citation

Andreas Fischer, Richard Janek, John Boniface, Thorsten Lill, K. J. Kanarik, Yang Pan, Vahid Vahedi, and Richard A. Gottscho "Plasma-assisted thermal atomic layer etching of Al₂O₃", Proc. SPIE 10149, Advanced Etch Technology for Nanopatterning VI, 101490H (21 March 2017); https://doi.org/10.1117/12.2258129

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