Irresistible Materials multi-trigger resist: the journey towards high volume manufacturing readiness

Warren Montgomery; Alexandra McClelland; David Ure; John Roth; Alex P. G. Robinson

doi:10.1117/12.2258092

24 March 2017 Irresistible Materials multi-trigger resist: the journey towards high volume manufacturing readiness

Warren Montgomery, Alexandra McClelland, David Ure, John Roth, Alex P. G. Robinson

Proceedings Volume 10143, Extreme Ultraviolet (EUV) Lithography VIII; 1014328 (2017) https://doi.org/10.1117/12.2258092
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

Irresistible Materials (IM) is a UK company spun out of the University of Birmingham. It is developing novel resist systems based on the Multi-trigger concept, and spin-on-carbon hardmask materials. IM has developed a new EUV resist that is nonmetal based, does not need a post exposure bake (PEB), and delivers high sensitivity, excellent contact hole resolution, with low LER. It is being readied for HVM through a partnership with Nano-C, Inc. (the Massachusetts based manufacturer of advanced electronic materials and chemicals). The transition to scalability will be the highlight of this discussion.

Citation Download Citation

Warren Montgomery, Alexandra McClelland, David Ure, John Roth, and Alex P. G. Robinson "Irresistible Materials multi-trigger resist: the journey towards high volume manufacturing readiness", Proc. SPIE 10143, Extreme Ultraviolet (EUV) Lithography VIII, 1014328 (24 March 2017); https://doi.org/10.1117/12.2258092

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