Hemicellulose block copolymers made from woods for wide-range directed self-assembly lithography enabling wider range of applicable patterning size

Kazuyo Morita; Kimiko Yamamoto

doi:10.1117/12.2257625

27 March 2017 Hemicellulose block copolymers made from woods for wide-range directed self-assembly lithography enabling wider range of applicable patterning size

Kazuyo Morita, Kimiko Yamamoto

Author Affiliations +

Proceedings Volume 10146, Advances in Patterning Materials and Processes XXXIV; 101460Y (2017) https://doi.org/10.1117/12.2257625
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

Xylan, one of hemicellulose family, block copolymer was newly developed for wide-range directed self-assembly lithography (DSA). Xylan is higher hydrophilic material because of having many hydroxy groups in one molecule. It means that xylan block copolymer has a possibility of high-chi block copolymer. Generally, DSA is focused on microphase separation for smaller size with high-chi block copolymer and not well known for larger size. In this study, xylan block copolymer was confirmed enabling wider range of patterning size, from smaller size to larger size. The key of xylan block copolymer is a new molecular structure of block copolymer and sugar chain control technology. Sugar content is the important parameter for not only micro-phase separation property but also line edge roughness (LER) and defects. Based on the sugar control technology, wide-range (hp 8.3nm to 26nm L/S and CD 10nm to 51nm hole) DSA patterning was demonstrated. Additionally it was confirmed that xylan block copolymer is suitable for sequential infiltration synthesis (SIS) process.

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Kazuyo Morita and Kimiko Yamamoto "Hemicellulose block copolymers made from woods for wide-range directed self-assembly lithography enabling wider range of applicable patterning size", Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 101460Y (27 March 2017); https://doi.org/10.1117/12.2257625

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KEYWORDS

Directed self assembly

Optical lithography

Lithography

Etching

Image processing

Line edge roughness

Polymethylmethacrylate

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