Paper
27 March 2017 Metal reduction at bulk chemical filtration
Toru Umeda, Shusaku Daikoku, Shuichi Tsuzuki, Tetsuya Murakami
Author Affiliations +
Abstract
OK73 thinner and cyclohexanone, both of which were spiked with metals were passed through Nylon 6,6 filter, varying flow rate, which include the conditions of both point-of-use and bulk filtrations. The influent and effluent metal concentrations were measured using ICP-MS for metal removal efficiency of the filtration. As a result, removal efficiency for some metals descended depending on the flow rate, while others maintained. Slower flow rate is recommended to maintain low metal concentration in bulk filtration based on the result. Metals in cyclohexanone were reduced at higher efficiency than in OK73 thinner, agrees with a metal removal model of hydrophilic adsorbent in organic solvent, evidenced in our previous paper. Further, metal reduction on 300 mm φ Si wafer after coating organic solvents with Nylon 6,6 filtration was evidenced with TREX analysis.
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Toru Umeda, Shusaku Daikoku, Shuichi Tsuzuki, and Tetsuya Murakami "Metal reduction at bulk chemical filtration", Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 1014629 (27 March 2017); https://doi.org/10.1117/12.2257937
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KEYWORDS
Metals

Semiconducting wafers

Silicon

Iron

Coating

Chromium

Lithium

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