Enhanced 28nm FD-SOI diffraction based overlay metrology based on holistic metrology qualification

Florent Dettoni; Régis Bouyssou; Christophe Dezauzier; Jerome Depre; Steffen Meyer; Christopher Prentice

doi:10.1117/12.2258206

28 March 2017 Enhanced 28nm FD-SOI diffraction based overlay metrology based on holistic metrology qualification

Florent Dettoni, Régis Bouyssou, Christophe Dezauzier, Jerome Depre, Steffen Meyer, Christopher Prentice

Proceedings Volume 10145, Metrology, Inspection, and Process Control for Microlithography XXXI; 101452B (2017) https://doi.org/10.1117/12.2258206
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

Continuous tightening of the overlay control budget in the semiconductor industry drives the need for improved overlay metrology capabilities. In this context, measurement accuracy needs to be addressed. The first part this study shows that Diffraction Based Overlay metrology accuracy can be improved with a dedicated methodology. This methodology involves the use of target design simulation software in order to maximize stack sensitivity and to minimize processes non uniformity impact on the measurement. In the second part this study focuses on Holistic Metrology Qualification (HMQ) methodology that allows selecting the best on-wafer target. The methodology is explained and discussed. It is demonstrated that HMQ helps to reduce target asymmetry impact on measurement uncertainty and to select primary recipe parameters (wavelength, polarization, etc…). Finally CD-SEM measurements were used to validate methodology results.

Citation Download Citation

Florent Dettoni, Régis Bouyssou, Christophe Dezauzier, Jerome Depre, Steffen Meyer, and Christopher Prentice "Enhanced 28nm FD-SOI diffraction based overlay metrology based on holistic metrology qualification", Proc. SPIE 10145, Metrology, Inspection, and Process Control for Microlithography XXXI, 101452B (28 March 2017); https://doi.org/10.1117/12.2258206

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available