Lab- and field-test results of MFIG, the first real-time vacuum-contamination sensor

Diederik Maas; Pim Muilwijk; Michel van Putten; Frank de Graaf; Olaf Kievit; Patrique Boerboom; Norbert B. Koster

doi:10.1117/12.2258230

28 March 2017 Lab- and field-test results of MFIG, the first real-time vacuum-contamination sensor

Diederik Maas, Pim Muilwijk, Michel van Putten, Frank de Graaf, Olaf Kievit, Patrique Boerboom, Norbert B. Koster

Proceedings Volume 10145, Metrology, Inspection, and Process Control for Microlithography XXXI; 101452I (2017) https://doi.org/10.1117/12.2258230
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

To produce high-end semiconductor products, clean vacuum is often required. Even small amounts of high-mass molecules can reduce product yield. The challenge is to timely detect the presence of relevant contaminants. This is where MFIG can help. The mass-filtered ion gauge sensor (MFIG) continuously and selectively monitors the presence of high-mass contaminant molecules with a sensitivity down to 1E-13 mbar at total pressures up to 1E-5 mbar. This contribution presents laboratory and field-test data to demonstrate the capabilities of the latest version of the MFIG sensor in continuously and selectively detecting high-mass contaminant molecules in (U)HV vacuum.

Citation Download Citation

Diederik Maas, Pim Muilwijk, Michel van Putten, Frank de Graaf, Olaf Kievit, Patrique Boerboom, and Norbert B. Koster "Lab- and field-test results of MFIG, the first real-time vacuum-contamination sensor", Proc. SPIE 10145, Metrology, Inspection, and Process Control for Microlithography XXXI, 101452I (28 March 2017); https://doi.org/10.1117/12.2258230

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