In this paper we describe the evaluation results of NIL the overlay performance using an up-to-date NIL tool for 300mm wafer. We show the progress of both "NIL-to-NIL" and "NIL-to-optical tool" distortion matching techniques. From these analyses based on actual NIL overlay data, we discuss the possibility of NIL overlay evolution to realize an on-product overlay accuracy to 3nm and beyond. |
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CITATIONS
Cited by 2 scholarly publications.
Nanoimprint lithography
Semiconducting wafers
Optical alignment
Overlay metrology
Distortion
Silicon
Error analysis