Low-frequency roughness mitigation on N7/N5 fin patterning (Conference Presentation)

Efrain Altamirano-Sánchez

doi:10.1117/12.2263468

27 April 2017 Low-frequency roughness mitigation on N7/N5 fin patterning (Conference Presentation)

Efrain Altamirano-Sánchez

Proceedings Volume 10149, Advanced Etch Technology for Nanopatterning VI; 101490A (2017) https://doi.org/10.1117/12.2263468
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

The abstract is not available

Conference Presentation

Citation Download Citation

Efrain Altamirano-Sánchez "Low-frequency roughness mitigation on N7/N5 fin patterning (Conference Presentation)", Proc. SPIE 10149, Advanced Etch Technology for Nanopatterning VI, 101490A (27 April 2017); https://doi.org/10.1117/12.2263468

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