Open Access Paper
5 May 2017 Front Matter: Volume 10115
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 10115, including the Title Page, Copyright information, Table of Contents, Introduction (if any), and Conference Committee listing.

The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org.

The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon.

Please use the following format to cite material from these proceedings:

Author(s), “Title of Paper,” in Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X, edited by Georg von Freymann, Winston V. Schoenfeld, Raymond C. Rumpf, Proceedings of SPIE Vol. 10115 (SPIE, Bellingham, WA, 2017) Seven-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510606715

ISBN: 9781510606722 (electronic)

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Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:

  • The five digits correspond to the SPIE volume number.

  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc. The CID Number appears on each page of the manuscript.

Authors

Numbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

Abrashitova, Ksenia A., 10

Adewole, Murthada, 18

Aggarwal, Ishwar D., 0B

Ameer, Guillermo, 0N

Baker, Evan, 0N

Bessonov, Vladimir O., 10

Bläsi, Benedikt, 02

Boerner, Volkmar, 0U

Bonifazi, Marcella, 0E

Bove, V. Michael, 0R, 0W

Buivydas, Ričardas, 0V

Busse, Lynda E., 0B

Butkus, Simas, 0V

Chizhov, Artem S., 10

Cormier, Denis, 08

Cui, Jingbiao, 18

Dahlem, Marcus S., 0D

Datta, Bianca C., 0R, 0W

Ding, Jun, 18

Domann, Gerhard, 0S

Ezhov, Alexander A., 10

Fanyaeu, I., 0X

Farsari, Maria, 1A

Farsheed, Adam C., 0N

Fedyanin, Andrey A., 10

Flores, Raquel, 0P

Franke, Jörg, 03

Frantz, Jesse A., 0B

Fratalocchi, Andrea, 0E

Gadonas, Roaldas, 0V, 11

Gailevicius, Darius, 0Z, 11

Gandhi, Shaunak, 08

George, David, 18

Gershenfeld, Neil, 0R

Gray, David, 1A

Grigalevičiūtė, Giedrė, 14

Gulkin, Dmitry N., 10

Hannigan, J. M., 04

Harnisch, Emely Marie, 0Q

Hartensveld, Matthew, 08

Hassan, Safaa, 18

Hasselmann, Sebastian, 0S

Hauser, Hubert, 02

Hayran, Zeki, 0Z, 11

Hoffmann, Gerd-Albert, 03

Höhn, Oliver, 02

Humbach, Oliver, 0U

Huong, Au Thi, 09

Iazikov, D., 04

Janeiro, Ricardo, 0P

Jolly, Sundeep, 0R, 0W

Jonušauskas, Linas, 0V, 11, 14

Juodkazis, Saulius, 0V, 0Z, 11

Kabouraki, Elmina, 1A

Karydis, Thrasyvoulos, 0R

Kašėtaitė, Sigita, 14

Kim, Cheoljoong, 12

Kim, Junoh, 12

Kokareva, Natalia G., 10

Koo, Gyo Hyun, 12

Kübler, Volker, 02

Kurt, Hamza, 0Z, 11

Kyi, Wilson, 19

Lai, Ngoc Diep, 09

Lee, Junsik, 12

Li, Jingting, 0K

Li, Li, 18

Li, Zeping, 15

Lin, Yuankun, 18

Liu, Cheng, 08

Liu, Man-Chi, 0L

Lott, James A., 19

Lowell, David, 18

Malinauskas, Mangirdas, 0V, 0Z, 11, 14

Mao, Fei, 09

Mazur, Eric, 0R, 0W

Mazzone, Valerio, 0E

Mei, Lihong, 15

Melkonyan, Henrik, 0D

Mick, Jörg, 0U

Mizeikis, Vygantas, 0X, 0Z, 11

Moebius, Michael, 0R, 0W

Moreira, Paulo, 0D

Mossberg, T. W., 04

Mück, Philip, 0U

Müller, Claas, 02

Nguyen, Dam Thuy Trang, 09

Odessey, Rache, 09

Ooi, Yu Kee, 08

Ostrauskaitė, Jolita, 14

Overmeyer, Ludger, 03

Paipulas, Domas, 0V

Pao, James J., 19

Peltier, Abigail, 0B

Pereira, Dionisio A., 0P

Pfeiffer, K., 13

Philipose, Usha, 18

Potter, Matthew, 0B

Poutous, Menelaos K., 0B

Qu, Xiaopeng, 15

Rekštytė, Sima, 0V, 14

Riaziat, Majid, 19

Ruhl, Thomas, 0U

Safronov, Kirill R., 10

Sakalauskas, Danas, 11

Sakellari, Ioanna, 1A

Šakirzanovas, Simas, 11

Sanghera, Jasbinder S., 0B

Sapkota, Gopal, 0B

Saudrais, Florent, 09

Savidis, Nickolaos, 0R, 0W

Schmitt, Robert, 0Q

Schulz, U., 13

Shaw, L. Brandon, 0B

Shih, Wei-Chuan, 0K

Shin, Dooseub, 12

Sim, Jee Hoon, 12

Skliutas, Edvinas, 14

Skylar-Scott, Mark A., 0L

Sloyan, Karen, 0D

Staliunas, Kestutis, 0Z, 11

Steenhusen, Sönke, 0S

Stöver, Christoph, 0U

Sun, Cheng, 0N

Suttmann, Oliver, 03

Szeghalmi, A., 13

Tong, Quang Cong, 09

Tucher, Nico, 02

Tünnermann, A., 13

Turduev, Mirbek, 0Z, 11

Ugras, Christopher, 08

Vamvakaki, Maria, 1A

van Lith, Robert, 0N

Viegas, Jaime, 0P

Ware, Henry Oliver T., 0N

Wellens, Christine, 02

Wolfer, Tim, 03

Won, Yong Hyub, 12

Wu, Ta-Chung, 19

Wu, Yuelong, 0L

Xu, Zhimou, 15

Yanik, Mehmet Fatih, 0L

Zeitler, Jochen, 03

Zhang, Hualiang, 18

Zhang, Jing, 08

Zhao, Fusheng, 0K

Conference Committee

Symposium Chairs

  • Jean-Emmanuel Broquin, IMEP-LAHC (France)

  • Shibin Jiang, AdValue Photonics, Inc. (United States)

Symposium Co-chairs

  • Connie J. Chang-Hasnain, University of California, Berkeley (United States)

  • Graham T. Reed, Optoelectronics Research Centre, University of Southampton (United Kingdom)

Program Track Chairs

  • Holger Becker, microfluidic ChipShop GmbH (Germany)

  • Winston V. Schoenfeld, CREOL, The College of Optics and Photonics, University of Central Florida (United States)

Conference Chairs

  • Georg von Freymann, Technische Universität Kaiserslautern (Germany)

  • Winston V. Schoenfeld, CREOL, The College of Optics and Photonics, University of Central Florida (United States)

  • Raymond C. Rumpf, The University of Texas at El Paso (United States)

Conference Program Committee

  • Cornelia Denz, Universität Münster (Germany)

  • Ruth Houbertz, Multiphoton Optics GmbH (Germany)

  • Saulius Juodkazis, Swinburne University of Technology (Australia)

  • Stephen M. Kuebler, CREOL, The College of Optics and Photonics, University of Central Florida (United States)

  • Akhlesh Lakhtakia, The Pennsylvania State University (United States)

  • Robert R. McLeod, University of Colorado at Boulder (United States)

  • Hernán R. Míguez, Institute of Materials Science of Seville (Spain)

  • Dennis W. Prather, University of Delaware (United States)

  • Aaron J. Pung, Clemson University (United States)

  • John A. Rogers, University of Illinois at Urbana-Champaign (United States)

  • Thomas J. Suleski, The University of North Carolina at Charlotte (United States)

  • Michael Thiel, Nanoscribe GmbH (Germany)

  • Sandra Wolff, Technische Universität Kaiserslautern (Germany)

Session Chairs

  • 1 Large Area Fabrication

    Ruth Houbertz, Multiphoton Optics GmbH (Germany)

  • 2 Nanoplasmonics I

    Isabelle Staude, Friedrich-Schiller-Universität Jena (Germany)

  • 3 Nanoplasmonics II

    Juan Francisco Galisteo-López, Consejo Superior de Investigaciones Científicas (Spain)

  • 4 Nanoplasmonics III

    Sandra Wolff, Technische Universität Kaiserslautern (Germany)

  • 5 10th Anniversary Session

    Georg von Freymann, Technische Universität Kaiserslautern (Germany)

  • 6 Advanced Fabrication with DMD and SLM Devices: Joint Session with Conferences 10115 and 10117

    Michael R. Douglass, Texas Instruments Inc. (United States)

    Georg von Freymann, Technische Universität Kaiserslautern (Germany)

  • 7 3D Metrology: Joint Session with Conferences 10115 and 10117

    Sanjeev Kumar M, Texas Instruments Pvt. Ltd. (India)

    Alfred Jacobsen, Visitech Engineering GmbH (Germany)

  • 8 Direct Laser Writing for Biological and Medical Applications: Joint Session with Conferences 10115 and 10095

    Michael Thiel, Nanoscribe GmbH (Germany)

  • 9 3D Laser Lithography for Production: Joint Session with Conferences 10115 and 10095

    Mangirdas Malinauskas, Vilnius University (Lithuania)

  • 10 3D Laser Lithography: Joint Session with Conferences 10115 and 10095

    Yuebing Zheng, The University of Texas at Austin (United States)

    Nico Tucher, Fraunhofer-Institut für Solare Energiesysteme (Germany)

© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 10115", Proc. SPIE 10115, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X, 1011501 (5 May 2017); https://doi.org/10.1117/12.2276160
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KEYWORDS
Laser applications

Geometrical optics

Photonics

Nanolithography

Nanoplasmonics

Lithography

Current controlled current source

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