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5 May 2017 Scaling LPP EUV sources to meet high volume manufacturing requirements (Conference Presentation)
Alexander A. Schafgans, Daniel J. Brown, Igor V. Fomenkov, Yezheng Tao, Michael Purvis, Slava I. Rokitski, Georgiy O. Vaschenko, Robert J. Rafac, David C. Brandt
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Proceedings Volume 10143, Extreme Ultraviolet (EUV) Lithography VIII; 101431I (2017) https://doi.org/10.1117/12.2258628
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States
Abstract
In this paper, we provide an overview of various challenges and their solutions for scaling laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source performance to enable high volume manufacturing. We will discuss improvements to source architecture that facilitated the increase of EUV power from 100W to >200W, and the technical challenges for power scaling of key source parameters and subsystems. Finally, we will describe current power-scaling research activities and provide a forward looking perspective for LPP EUV sources towards 500W.
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Alexander A. Schafgans, Daniel J. Brown, Igor V. Fomenkov, Yezheng Tao, Michael Purvis, Slava I. Rokitski, Georgiy O. Vaschenko, Robert J. Rafac, and David C. Brandt "Scaling LPP EUV sources to meet high volume manufacturing requirements (Conference Presentation)", Proc. SPIE 10143, Extreme Ultraviolet (EUV) Lithography VIII, 101431I (5 May 2017); https://doi.org/10.1117/12.2258628
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Cited by 6 scholarly publications.
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KEYWORDS
Extreme ultraviolet
High volume manufacturing
Extreme ultraviolet lithography
Current controlled current source
Lithography
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