Scatterometry for advanced process control in semiconductor device manufacturing

Arie den Boef; Hugo Cramer; Stefan Petra; Bastiaan Onne Fagginger Auer; Jolanda Schmetz-Schagen; Armand Koolen; Olaf van Loon; Gudrun de Gersem; Pieter Klandermans; Eric Bakker

doi:10.1117/12.2270595

13 June 2017 Scatterometry for advanced process control in semiconductor device manufacturing

Arie den Boef, Hugo Cramer, Stefan Petra, Bastiaan Onne Fagginger Auer, Jolanda Schmetz-Schagen, Armand Koolen, Olaf van Loon, Gudrun de Gersem, Pieter Klandermans, Eric Bakker

Author Affiliations +

Proceedings Volume 10449, Fifth International Conference on Optical and Photonics Engineering; 1044916 (2017) https://doi.org/10.1117/12.2270595
Event: Fifth International Conference on Optical and Photonics Engineering, 2017, Singapore, Singapore

Abstract

A concise explanation of spectroscopic scatterometry is presented that is used for modelbased shape metrology of etched features in the production of Memory and Logic semiconductor devices. We also present an angle-resolved scatterometry technique that can measure at high throughput on very small test targets. First measured results are shown that demonstrate the capability on 5×5 μm² targets.

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Arie den Boef, Hugo Cramer, Stefan Petra, Bastiaan Onne Fagginger Auer, Jolanda Schmetz-Schagen, Armand Koolen, Olaf van Loon, Gudrun de Gersem, Pieter Klandermans, and Eric Bakker "Scatterometry for advanced process control in semiconductor device manufacturing", Proc. SPIE 10449, Fifth International Conference on Optical and Photonics Engineering, 1044916 (13 June 2017); https://doi.org/10.1117/12.2270595

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