Free space optical interconnect phase holograms fabricated in poly-methyl methacrylate films by direct-write electron beam lithography have been characterized both physically and optically. Performance of holograms containing common fabrication errors is simulated using both Fourier optics and, for a simple one dimensional hologram, a numerical solution of the Helmholtz equation. The degradation of optical performance due to measured fabrication errors and design errors is discussed in view of the simulation results.
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Citation
Paul D. Maker ; Daniel W. Wilson and Richard E. Muller
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Fabrication and performance of optical-interconnect analog-phase holograms made by electron-beam lithography
", Proc. SPIE 10284, Optoelectronic Interconnects and Packaging, 102840O (July 7, 2017); doi:10.1117/12.229275; http://dx.doi.org/10.1117/12.229275