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Proceedings Article

Fabrication and performance of optical-interconnect analog-phase holograms made by electron-beam lithography

[+] Author Affiliations
Paul D. Maker, Daniel W. Wilson, Richard E. Muller

Jet Propulsion Lab. (United States)

Proc. SPIE 10284, Optoelectronic Interconnects and Packaging, 102840O (July 7, 2017); doi:10.1117/12.229275
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From Conference Volume 10284

  • Optoelectronic Interconnects and Packaging
  • Bellingham, United States | January 13, 2017

abstract

Free space optical interconnect phase holograms fabricated in poly-methyl methacrylate films by direct-write electron beam lithography have been characterized both physically and optically. Performance of holograms containing common fabrication errors is simulated using both Fourier optics and, for a simple one dimensional hologram, a numerical solution of the Helmholtz equation. The degradation of optical performance due to measured fabrication errors and design errors is discussed in view of the simulation results. © (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation

Paul D. Maker ; Daniel W. Wilson and Richard E. Muller
" Fabrication and performance of optical-interconnect analog-phase holograms made by electron-beam lithography ", Proc. SPIE 10284, Optoelectronic Interconnects and Packaging, 102840O (July 7, 2017); doi:10.1117/12.229275; http://dx.doi.org/10.1117/12.229275


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