Multi-beam mask writer MBM-1000

Hiroshi Matsumoto; Hiroshi Yamashita; Takao Tamura; Kenji Ohtoshi

doi:10.1117/12.2283033

13 July 2017 Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Hiroshi Yamashita, Takao Tamura, Kenji Ohtoshi

Proceedings Volume 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology; 104540E (2017) https://doi.org/10.1117/12.2283033
Event: Photomask Japan 2017, 2017, Yokohama, Japan

Abstract

Multi-beam mask writer MBM-1000 will be released in Q4 2017 for N5 semiconductor production. Performance of MBM-1000 is under verification and tuning by using alpha tool upgraded to high-volume manufacturing (HVM) system. It is designed to realize better resolution and higher throughput than EBM-9500, our latest variable-shaped-beam writer, at shot count higher than 500 Gshot/pass. Writing test after upgrade confirmed that MBM-1000 has better beam resolution than EBM-9500 as expected by optics design. It also showed that position of beam array projected on target was stable during one hour writing enough to accomplish registration target. Design of data transfer system and BAA for 300-Gbps data rate is described.

Citation Download Citation

Hiroshi Matsumoto, Hiroshi Yamashita, Takao Tamura, and Kenji Ohtoshi "Multi-beam mask writer MBM-1000", Proc. SPIE 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540E (13 July 2017); https://doi.org/10.1117/12.2283033

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