Cycle time reduction by Html report in mask checking flow

Jian-Cheng Chen; Min-Ying Lu; Xiang Fang; Ming-Feng Shen; Shou-Yuan Ma; Chuen-Huei Yang; Joe Tsai; Rachel Lee; Erwin Deng; Ling-Chieh Lin; Hung-Yueh Liao; Jenny Tsai; Amanda Bowhill; Hien Vu; Gordon Russell

doi:10.1117/12.2278691

13 July 2017 Cycle time reduction by Html report in mask checking flow

Jian-Cheng Chen, Min-Ying Lu, Xiang Fang, Ming-Feng Shen, Shou-Yuan Ma, Chuen-Huei Yang, Joe Tsai, Rachel Lee, Erwin Deng, Ling-Chieh Lin, Hung-Yueh Liao, Jenny Tsai, Amanda Bowhill, Hien Vu, Gordon Russell

Author Affiliations +

Proceedings Volume 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology; 104540G (2017) https://doi.org/10.1117/12.2278691
Event: Photomask Japan 2017, 2017, Yokohama, Japan

Abstract

The Mask Data Correctness Check (MDCC) is a reticle-level, multi-layer DRC-like check evolved from mask rule check (MRC). The MDCC uses extended job deck (EJB) to achieve mask composition and to perform a detailed check for positioning and integrity of each component of the reticle. Different design patterns on the mask will be mapped to different layers. Therefore, users may be able to review the whole reticle and check the interactions between different designs before the final mask pattern file is available. However, many types of MDCC check results, such as errors from overlapping patterns usually have very large and complex-shaped highlighted areas covering the boundary of the design. Users have to load the result OASIS file and overlap it to the original database that was assembled in MDCC process on a layout viewer, then search for the details of the check results. We introduce a quick result-reviewing method based on an html format report generated by Calibre® RVE. In the report generation process, we analyze and extract the essential part of result OASIS file to a result database (RDB) file by standard verification rule format (SVRF) commands. Calibre® RVE automatically loads the assembled reticle pattern and generates screen shots of these check results. All the processes are automatically triggered just after the MDCC process finishes. Users just have to open the html report to get the information they need: for example, check summary, captured images of results and their coordinates.

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Jian-Cheng Chen, Min-Ying Lu, Xiang Fang, Ming-Feng Shen, Shou-Yuan Ma, Chuen-Huei Yang, Joe Tsai, Rachel Lee, Erwin Deng, Ling-Chieh Lin, Hung-Yueh Liao, Jenny Tsai, Amanda Bowhill, Hien Vu, and Gordon Russell "Cycle time reduction by Html report in mask checking flow", Proc. SPIE 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540G (13 July 2017); https://doi.org/10.1117/12.2278691

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