MTO-like reference mask modeling for advanced inverse lithography technology patterns

Jongju Park; Jongin Moon; Suein Son; Donghoon Chung; Byung-Gook Kim; Chan-Uk Jeon; Patrick LoPresti; Shan Xue; Sonny Wang; Bill Broadbent; Soonho Kim; Jiuk Hur; Min Choo

doi:10.1117/12.2282406

13 July 2017 MTO-like reference mask modeling for advanced inverse lithography technology patterns

Jongju Park, Jongin Moon, Suein Son, Donghoon Chung, Byung-Gook Kim, Chan-Uk Jeon, Patrick LoPresti, Shan Xue, Sonny Wang, Bill Broadbent, Soonho Kim, Jiuk Hur, Min Choo

Author Affiliations +

Proceedings Volume 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology; 104540J (2017) https://doi.org/10.1117/12.2282406
Event: Photomask Japan 2017, 2017, Yokohama, Japan

Abstract

Advanced Inverse Lithography Technology (ILT) can result in mask post-OPC databases with very small address units, all-angle figures, and very high vertex counts. This creates mask inspection issues for existing mask inspection database rendering. These issues include: large data volumes, low transfer rate, long data preparation times, slow inspection throughput, and marginal rendering accuracy leading to high false detections. This paper demonstrates the application of a new rendering method including a new OASIS-like mask inspection format, new high-speed rendering algorithms, and related hardware to meet the inspection challenges posed by Advanced ILT masks.

Citation Download Citation

Jongju Park, Jongin Moon, Suein Son, Donghoon Chung, Byung-Gook Kim, Chan-Uk Jeon, Patrick LoPresti, Shan Xue, Sonny Wang, Bill Broadbent, Soonho Kim, Jiuk Hur, and Min Choo "MTO-like reference mask modeling for advanced inverse lithography technology patterns", Proc. SPIE 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540J (13 July 2017); https://doi.org/10.1117/12.2282406

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