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Proceedings Article

Sub-100nm material processing with sub-15 femtosecond picojoule near infrared laser pulses

[+] Author Affiliations
Karsten König

Saarland Univ. (Germany) and Univ. of California, Irvine (USA)

Aisada Uchugonova, Martin Straub, Huijing Zhang, Maziar Afshar, Dara Feili, Helmut Seidel

Saarland Univ. (Germany)

Proc. SPIE 7903, Multiphoton Microscopy in the Biomedical Sciences XI, 79031M (February 22, 2011); doi:10.1117/12.875004
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From Conference Volume 7903

  • Multiphoton Microscopy in the Biomedical Sciences XI
  • Ammasi Periasamy; Karsten König; Peter T. C. So
  • San Francisco, California, USA | January 22, 2011

abstract

Ultrabroad band 12 femtosecond near infrared laser pulses at transient TW/cm2 intensities and low picojoule pulse energies (mean powers < 20 mW at 85 MHz repetition rate) have been used to perform material nanoprocessing based on multiphoton ionization and plasma formation. Cut sizes of sub-wavelength, sub-100 nm which is far beyond the Abbe diffraction limit have been realized without any collateral damage effect in silicon wafers, photoresists, glass, polymers, metals, and biological targets. Multiphoton sub-15fs microscopes may become novel non-invasive 3D tools for highly precise nanoprocessing of inorganic and organic targets as well as two-photon 3D imaging.

© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation

Karsten König ; Aisada Uchugonova ; Martin Straub ; Huijing Zhang ; Maziar Afshar, et al.
"Sub-100nm material processing with sub-15 femtosecond picojoule near infrared laser pulses", Proc. SPIE 7903, Multiphoton Microscopy in the Biomedical Sciences XI, 79031M (February 22, 2011); doi:10.1117/12.875004; http://dx.doi.org/10.1117/12.875004


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