On the damage behaviour of Al2O3 insulating layers in thin film systems for the fabrication of sputtered strain gauges

Oliver Suttmann; Ulrich Klug; Rainer Kling

doi:10.1117/12.876134

11 February 2011 On the damage behaviour of Al₂O₃ insulating layers in thin film systems for the fabrication of sputtered strain gauges

Oliver Suttmann, Ulrich Klug, Rainer Kling

Author Affiliations +

Proceedings Volume 7925, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XI; 792515 (2011) https://doi.org/10.1117/12.876134
Event: SPIE LASE, 2011, San Francisco, California, United States

Abstract

We report on ablation experiments of sputter deposited thin film systems of NiCr and Al₂O₃ for the fabrication of strain sensors. To ensure proper functionality of the electrical circuits, the metal film has to be selectively removed while damage in the Al₂O₃ films has to be avoided. Damage thresholds of the Al₂O₃ layer are investigated and damage mechanisms are discussed. Damage thresholds decrease with increasing number of scans until reaching a constant value. The processing window defined as the ratio of Al₂O₃ damage threshold and NiCr ablation threshold increases with increasing film thickness and number of scans.

Citation Download Citation

Oliver Suttmann, Ulrich Klug, and Rainer Kling "On the damage behaviour of Al₂O₃ insulating layers in thin film systems for the fabrication of sputtered strain gauges", Proc. SPIE 7925, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XI, 792515 (11 February 2011); https://doi.org/10.1117/12.876134

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