We present algorithmic details and applications of the reduced basis method as efficient Maxwell solver to nanophotonic applications including examples from mask optimization in photolithography and parameter retrieval in inverse problems, e.g., in optical metrology. The reduced basis method is a currently studied approach to the multiple solution of problems depending on a number of geometrical, material and source parameters. Such problems occur frequently in optimization tasks where parameters have to be adjusted in order to minimize some error functionals or in production environments where deviations from ideal structures have to be controlled.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
