Paper
28 February 2011 Finite difference simulation of thermally tuned hexagonal photonic crystals
Author Affiliations +
Abstract
Thermal tuning of hexagonal photonic crystals by absorption of laser energy is examined through finite difference numerical simulation. The photonic crystals are patterned in the device layer of the silicon on insulator (SOI) platform. The thermal equations, which include contributions from laser absorption gain, conduction loss, and radiation loss are combined to obtain a heat balance equation. This governing equation is modeled using a thermodynamic finite difference computation engine. To ensure the stability of the thermal model within the transient regime the velocity of heat propagation is calculated and included as a courant factor controlling the coarseness of the discretization grid and time step interval. The thermal distribution obtained from the numerical simulation, combined with the thermo-optic effect, can be used to alter the initial dielectric distribution of the device layer. The integration of the change in refractive index into the existing dielectric enables the thermal effects to be included into a standard optical finite difference time domain (FDTD) engine. Through the implementation of the optical and thermal simulation tools, the laser thermal tuning of the band gaps and localized states of hexagonal photonic crystals will be explored. The temperature dependence of the central wavelength of the localized states will be calculated.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. R. Newman and R. C. Gauthier "Finite difference simulation of thermally tuned hexagonal photonic crystals", Proc. SPIE 7946, Photonic and Phononic Properties of Engineered Nanostructures, 79460G (28 February 2011); https://doi.org/10.1117/12.873939
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Photonic crystals

Dielectrics

Finite-difference time-domain method

Silicon

Refractive index

Absorption

Thermography

Back to Top