Fundamental study of droplet spray characteristics in photomask cleaning for advanced lithography

C. L. Lu; C. H. Yu; W. H. Liu; Luke Hsu; Angus Chin; S. C. Lee; Anthony Yen; Gaston Lee; Peter Dress; Sherjang Singh; Uwe Dietze

doi:10.1117/12.864303

24 September 2010 Fundamental study of droplet spray characteristics in photomask cleaning for advanced lithography

C. L. Lu, C. H. Yu, W. H. Liu, Luke Hsu, Angus Chin, S. C. Lee, Anthony Yen, Gaston Lee, Peter Dress, Sherjang Singh, Uwe Dietze

Author Affiliations +

Proceedings Volume 7823, Photomask Technology 2010; 782325 (2010) https://doi.org/10.1117/12.864303
Event: SPIE Photomask Technology, 2010, Monterey, California, United States

Abstract

The fundamentals of droplet-based cleaning of photomasks are investigated and performance regimes that enable the use of binary spray technologies in advanced mask cleaning are identified. Using phase Doppler anemometry techniques, the effect of key performance parameters such as liquid and gas flow rates and temperature, nozzle design, and surface distance on droplet size, velocity, and distributions were studied. The data are correlated to particle removal efficiency (PRE) and feature damage results obtained on advanced photomasks for 193-nm immersion lithography.

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C. L. Lu, C. H. Yu, W. H. Liu, Luke Hsu, Angus Chin, S. C. Lee, Anthony Yen, Gaston Lee, Peter Dress, Sherjang Singh, and Uwe Dietze "Fundamental study of droplet spray characteristics in photomask cleaning for advanced lithography", Proc. SPIE 7823, Photomask Technology 2010, 782325 (24 September 2010); https://doi.org/10.1117/12.864303

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