Waveguide fabrication by ionic interchange with different methods

P. Barrios; A. Rodríguez; S. Guel; G. Ramírez

doi:10.1117/12.674414

10 February 2006 Waveguide fabrication by ionic interchange with different methods

P. Barrios, A. Rodríguez, S. Guel, G. Ramírez

Proceedings Volume 6046, Fifth Symposium Optics in Industry; 604607 (2006) https://doi.org/10.1117/12.674414
Event: Fifth Symposium Optics in Industry, 2005, Santiago De Queretaro, Mexico

Abstract

In this work we present the fabrication process of channel waveguides by ionic exchange on a glass substrate. To delimit the channel areas on the glass substrate two procedures are used. The first one is by conventional lithography, making use of an aligner, photoresist and a mask. The second consists in implementing a holographic interferometer to imprint on the photoresist layered substrate, a straight fringes interference pattern of desired period. The glass index increasing in the channels area is obtained by Na+/K+ ionic interchange. We present the near field characterization results of the waveguides fabricated by the conventional method; as well as results of the parameters optimization and grids, fabricated by the holographic method.

Citation Download Citation

P. Barrios, A. Rodríguez, S. Guel, and G. Ramírez "Waveguide fabrication by ionic interchange with different methods", Proc. SPIE 6046, Fifth Symposium Optics in Industry, 604607 (10 February 2006); https://doi.org/10.1117/12.674414

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