Optics contamination studies in support of high-throughput EUV lithography tools

S. B. Hill; N. S. Faradzhev; L. J. Richter; S. Grantham; C. Tarrio; T. B. Lucatorto; S. Yulin; M. Schürmann; V. Nesterenko; T. Feigl

doi:10.1117/12.879852

25 March 2011 Optics contamination studies in support of high-throughput EUV lithography tools

S. B. Hill, N. S. Faradzhev, L. J. Richter, S. Grantham, C. Tarrio, T. B. Lucatorto, S. Yulin, M. Schürmann, V. Nesterenko, T. Feigl

Author Affiliations +

Proceedings Volume 7969, Extreme Ultraviolet (EUV) Lithography II; 79690M (2011) https://doi.org/10.1117/12.879852
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

We report on optics contamination rates induced by exposure to broad-bandwidth, high-intensity EUV radiation peaked near 8 nm in a new beamline at the NIST synchrotron. The peak intensity of 50 mW/mm² allows extension of previous investigations of contamination by in-band 13.5 nm radiation at intensities an order of magnitude lower. We report nonlinear pressure and intensity scaling of the contamination rates which is consistent with the earlier lower-intensity studies. The magnitude of the contamination rate per unit EUV dose, however, was found to be significantly lower for the lower wavelength exposures. We also report an apparent dose-dependent correlation between the thicknesses as measured by spectroscopic ellipsometry and XPS for the carbon deposits created using the higher doses available on the new beamline. It is proposed that this is due to different sensitivities of the metrologies to variations in the density of the deposited C induced by prolonged EUV irradiation.

Citation Download Citation

S. B. Hill, N. S. Faradzhev, L. J. Richter, S. Grantham, C. Tarrio, T. B. Lucatorto, S. Yulin, M. Schürmann, V. Nesterenko, and T. Feigl "Optics contamination studies in support of high-throughput EUV lithography tools", Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79690M (25 March 2011); https://doi.org/10.1117/12.879852

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available