Exposure of high-reflecting fluoride coatings under high fluence conditions at 193nm

H. Blaschke; W. Riggers; D. Ristau

doi:10.1117/12.867257

6 December 2010 Exposure of high-reflecting fluoride coatings under high fluence conditions at 193nm

H. Blaschke, W. Riggers, D. Ristau

Proceedings Volume 7842, Laser-Induced Damage in Optical Materials: 2010; 78420I (2010) https://doi.org/10.1117/12.867257
Event: Laser Damage Symposium XLII: Annual Symposium on Optical Materials for High Power Lasers, 2010, Boulder, Colorado, United States

Abstract

The paper presents results of investigations in evaporated LaF₃-MgF₂ and LaF₃-AlF₃ classical high-reflecting multilayers deposited on super-polished CaF₂ substrates. In addition to typical spectroscopic inspections up to the band edge of fluoride substances in the VUV spectral range, the work is dedicated to the determination of laser-induced damage threshold at moderate pulse numbers for the wavelength 193 nm. Further on, dose dependent irradiation tests are performed well below the fluence level of damage onset indicating changes for the spectral transfer functions. These experimental observations are discussed in order to find a correlation to the characteristic damage behavior of both material combinations. In contrast to the standard evaporation process, partial-reflecting fluoride coatings have been deposited under ion-assisted conditions with fluorine gas. Results of damage tests will show excellent performance to high fluence levels.

Citation Download Citation

H. Blaschke, W. Riggers, and D. Ristau "Exposure of high-reflecting fluoride coatings under high fluence conditions at 193nm", Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 78420I (6 December 2010); https://doi.org/10.1117/12.867257

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