Paper
8 April 2011 Development of debris-mitigation tool for HVM DPP source
Hironobu Yabuta, Shinsuke Mori, Takahiro Inoue, Yusuke Teramoto, Hiroto Sato, Kazuaki Hotta
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Abstract
Debris-mitigation tools (DMTs) have been used in DPP sources and the performance has been well proven in alpha sources. In beta and HVM sources, requirement to the DMT is increasing to fulfill the power and lifetime requirements simultaneously. In order to bring DPP technology into HVM level, a high-performance DMT has been developed. It has high mitigation performance for both neutral and ionic debris, large collection angle of the collector having high optical transmission, and withstand large thermal input from the discharge source head. Experiments were carried out using mirror samples and proved sufficient performance with which no sputtering and deposition were observed.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hironobu Yabuta, Shinsuke Mori, Takahiro Inoue, Yusuke Teramoto, Hiroto Sato, and Kazuaki Hotta "Development of debris-mitigation tool for HVM DPP source", Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79692U (8 April 2011); https://doi.org/10.1117/12.879471
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CITATIONS
Cited by 3 scholarly publications.
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KEYWORDS
Tin

Ruthenium

Reflectivity

Extreme ultraviolet lithography

Extreme ultraviolet

Sputter deposition

Mirrors

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