Interaction of benzene and toluene vapors with Ru(0001) surface: relevance to MLM contamination

B. V. Yakshinskiy; Q. Shen; R. A. Bartynski

doi:10.1117/12.879297

8 April 2011 Interaction of benzene and toluene vapors with Ru(0001) surface: relevance to MLM contamination

B. V. Yakshinskiy, Q. Shen, R. A. Bartynski

Proceedings Volume 7969, Extreme Ultraviolet (EUV) Lithography II; 796922 (2011) https://doi.org/10.1117/12.879297
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

We report studies of the thermal and non-thermal interaction of benzene and toluene vapors with the Ru(0001) surface, a model cap layer for multilayer mirrors (MLM), using temperature programmed desorption (TPD), X-ray photoelectron spectroscopy (XPS), low energy ion scattering (LEIS), electron stimulated desorption (ESD), low electron energy diffraction (LEED), and scanning tunneling microscopy (STM). A low energy electron source (100 eV) is used to simulate radiation damage on the surface produced by EUV photons. Heating of adsorbed hydrocarbons leads to a stepwise dehydrogenation and buildup a self-limited carbon monolayer. Graphene monolayer and bilayer formation on Ru by hydrocarbon pyrolysis or by carbon segregation from the sample bulk is examined as a possible way to reduce the surface contamination rate. The binding energy of the hydrocarbon molecule is found to be smaller on a graphene layer than on disordered carbon. Electron bombardment of both bare and graphene covered Ru surface in the presence of benzene and toluene leads to C-buildup. However, the presence of a graphene monolayer on Ru surface reduces the electron-induced carbon growth rate at low electron flux conditions.

Citation Download Citation

B. V. Yakshinskiy, Q. Shen, and R. A. Bartynski "Interaction of benzene and toluene vapors with Ru(0001) surface: relevance to MLM contamination", Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 796922 (8 April 2011); https://doi.org/10.1117/12.879297

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