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Proceedings Article

Interaction of benzene and toluene vapors with Ru(0001) surface: relevance to MLM contamination

[+] Author Affiliations
B. V. Yakshinskiy, Q. Shen, R. A. Bartynski

Rutgers, The State Univ. of New Jersey (USA)

Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 796922 (April 07, 2011); doi:10.1117/12.879297
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From Conference Volume 7969

  • Extreme Ultraviolet (EUV) Lithography II
  • Bruno M. La Fontaine; Patrick P. Naulleau
  • San Jose, California, USA | February 27, 2011

abstract

We report studies of the thermal and non-thermal interaction of benzene and toluene vapors with the Ru(0001) surface, a model cap layer for multilayer mirrors (MLM), using temperature programmed desorption (TPD), X-ray photoelectron spectroscopy (XPS), low energy ion scattering (LEIS), electron stimulated desorption (ESD), low electron energy diffraction (LEED), and scanning tunneling microscopy (STM). A low energy electron source (100 eV) is used to simulate radiation damage on the surface produced by EUV photons. Heating of adsorbed hydrocarbons leads to a stepwise dehydrogenation and buildup a self-limited carbon monolayer. Graphene monolayer and bilayer formation on Ru by hydrocarbon pyrolysis or by carbon segregation from the sample bulk is examined as a possible way to reduce the surface contamination rate. The binding energy of the hydrocarbon molecule is found to be smaller on a graphene layer than on disordered carbon. Electron bombardment of both bare and graphene covered Ru surface in the presence of benzene and toluene leads to C-buildup. However, the presence of a graphene monolayer on Ru surface reduces the electron-induced carbon growth rate at low electron flux conditions.

© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation

B. V. Yakshinskiy ; Q. Shen and R. A. Bartynski
"Interaction of benzene and toluene vapors with Ru(0001) surface: relevance to MLM contamination", Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 796922 (April 07, 2011); doi:10.1117/12.879297; http://dx.doi.org/10.1117/12.879297


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