Paper
2 April 2011 Nanoimprint process for 2.5Tb/in2 bit patterned media fabricated by self-assembling method
Yasuaki Ootera, Akiko Yuzawa, Takuya Shimada, Ryousuke Yamamoto, Yoshiyuki Kamata, Naoko Kihara, Akira Kikitsu
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Abstract
Bit patterned media (BPM) is a promising candidate for high-density magnetic recording media beyond 2.5 Tb/in2. To realize such a high-density BPM, directed self-assembling (DSA) technology is a possible solution. On the other hand, from the viewpoint of low-cost production, nanoimprint lithography is a promising process for the mass-production of such a high-density BPM. We examine the replication of the BPM etching mask by UV nanoimprint process. At first, the BPM silicon master mold consisting of servo pattern with dot array is made by the DSA method using PS-PDMS. For the 30-nm pitch corresponding to the density of 2.5 Tb/in2, the nickel stamper is replicated from the silicon master mold by electroplating. The etching mask is transcribed by the UV nanoimprint process with the transparent mold replicated from the nickel mother stamper. On the other hand, as for the DSA-BPM pattern of 17-nm pitch corresponding to the density of 2.5 Tb/in2, we adopt an alternative process and confirm the replication possibility.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yasuaki Ootera, Akiko Yuzawa, Takuya Shimada, Ryousuke Yamamoto, Yoshiyuki Kamata, Naoko Kihara, and Akira Kikitsu "Nanoimprint process for 2.5Tb/in2 bit patterned media fabricated by self-assembling method", Proc. SPIE 7970, Alternative Lithographic Technologies III, 79700K (2 April 2011); https://doi.org/10.1117/12.878936
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Cited by 6 scholarly publications.
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KEYWORDS
Beam propagation method

Silicon

Etching

Nickel

Servomechanisms

Nanoimprint lithography

Magnetism

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