A new releasing material and continuous nano-imprinting in mold replication for patterned media

Kouta Suzuki; Hideo Kobayashi; Takashi Sato; Hiroshi Yamashita; Tsuyoshi Watanabe

doi:10.1117/12.881581

4 April 2011 A new releasing material and continuous nano-imprinting in mold replication for patterned media

Kouta Suzuki, Hideo Kobayashi, Takashi Sato, Hiroshi Yamashita, Tsuyoshi Watanabe

Proceedings Volume 7970, Alternative Lithographic Technologies III; 79700U (2011) https://doi.org/10.1117/12.881581
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

Nano-Imprint Lithography and a mold, mold replication from an EB master mold as well, those are essential for a large-scale production of patterned media. In nano-imprinting, since it is contact printing, a higher separation force might cause damages to the master and imprinting tool, degradation in pattern quality as well. Those difficulties also work to retard continuous imprinting for the mold replication. Then, we focused on release materials characterization and selection to facilitate clean separation between cured resist and the master. This paper describes a novel release material, and continuous nano-imprinting results with it for replica mold fabrication from an EB master for the patterned media application.

Citation Download Citation

Kouta Suzuki, Hideo Kobayashi, Takashi Sato, Hiroshi Yamashita, and Tsuyoshi Watanabe "A new releasing material and continuous nano-imprinting in mold replication for patterned media", Proc. SPIE 7970, Alternative Lithographic Technologies III, 79700U (4 April 2011); https://doi.org/10.1117/12.881581

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