Influence of the charging effect on the precision of measuring EUV mask features

Yasushi Nishiyama; Hidemitsu Hakii; Isao Yonekura; Keishi Tanaka; Yasutaka Kikuchi

doi:10.1117/12.878728

20 April 2011 Influence of the charging effect on the precision of measuring EUV mask features

Yasushi Nishiyama, Hidemitsu Hakii, Isao Yonekura, Keishi Tanaka, Yasutaka Kikuchi

Proceedings Volume 7971, Metrology, Inspection, and Process Control for Microlithography XXV; 79710C (2011) https://doi.org/10.1117/12.878728
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

Influence of the prominent charging effect on the precision of measuring EUV mask features using CD-SEM was studied. The dimensions of EUV mask features continuously measured by CD-SEM gradually varied because of the charging. The charging effect on the measured CD variation mainly consists of three factors: 1) shift of the incident points of primary electrons deflected by the surface charge, 2) distortions of the profiles of secondary electron signal intensity caused by the deflection of the secondary electrons, 3) deviation of the maximum slope points of the secondary electron signal intensity due to the variation of the image contrast. For those three factors described above, how the material constant affect the CD variation measured by CD-SEM is discussed.

Citation Download Citation

Yasushi Nishiyama, Hidemitsu Hakii, Isao Yonekura, Keishi Tanaka, and Yasutaka Kikuchi "Influence of the charging effect on the precision of measuring EUV mask features", Proc. SPIE 7971, Metrology, Inspection, and Process Control for Microlithography XXV, 79710C (20 April 2011); https://doi.org/10.1117/12.878728

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