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Proceedings Article

Applicability of global source mask optimization to 22/20nm node and beyond

[+] Author Affiliations
Kehan Tian, Jaione Tirapu-Azpiroz, Jason Meiring

IBM Corp. (USA)

Moutaz Fakyry, Aasutosh Dave, Alexander Tritchkov, Bruce Durgan, Kostas Adam, Gabriel Berger, Gandharv Bhatara

Mentor Graphics Corp. (USA)

Alan E. Rosenbluth, David Melville, Scott Mansfield, Alexander Wei, Young Kim

IBM Thomas J. Watson Research Ctr. (USA)

Masaharu Sakamoto, Tadanobu Inoue

IBM Research, Tokyo (Japan)

Henning Haffner

Infineon Technologies North America Corp. (USA)

Byung-Sung Kim

SAMSUNG Electronics Co., Ltd. (USA)

Proc. SPIE 7973, Optical Microlithography XXIV, 79730C (March 22, 2011); doi:10.1117/12.879703
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From Conference Volume 7973

  • Optical Microlithography XXIV
  • Mircea V. Dusa
  • San Jose, California | February 27, 2011


Source-mask optimization (SMO) in optical lithography has in recent years been the subject of increased exploration as an enabler of 22/20nm and beyond technology nodes [1-6]. It has been shown that intensive optimization of the fundamental degrees of freedom in the optical system allows for the creation of non-intuitive solutions in both the source and mask, which yields improved lithographic performance. This paper will demonstrate the value of SMO software in resolution enhancement techniques (RETs). Major benefits of SMO include improved through-pitch performance, the possibility of avoiding double exposure, and superior performance on two dimensional (2D) features. The benefits from only optimized source, only optimized mask, and both source and mask optimized together will be demonstrated. Furthermore, we leverage the benefits from intensively optimized masks to solve large array problems in memory use models (MUMs). Mask synthesis and data prep flows were developed to incorporate the usage of SMO, including both RETs and MUMs, in several critical layers during 22/20nm technology node development. Experimental assessment will be presented to demonstrate the benefits achieved by using SMO during 22/20nm node development.

© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.

Kehan Tian ; Moutaz Fakyry ; Aasutosh Dave ; Alexander Tritchkov ; Jaione Tirapu-Azpiroz, et al.
"Applicability of global source mask optimization to 22/20nm node and beyond", Proc. SPIE 7973, Optical Microlithography XXIV, 79730C (March 22, 2011); doi:10.1117/12.879703; http://dx.doi.org/10.1117/12.879703

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