Full Content is available to subscribers

Subscribe/Learn More  >
Proceedings Article

New 0.75 NA ArF scanning lithographic tool

[+] Author Affiliations
Lifeng Duan, Jianrui Cheng, Gang Sun, Yonghui Chen

Shanghai Micro Electronics Equipment Co., Ltd. (China)

Proc. SPIE 7973, Optical Microlithography XXIV, 79732D (March 22, 2011); doi:10.1117/12.879376
Text Size: A A A
From Conference Volume 7973

  • Optical Microlithography XXIV
  • San Jose, California, USA | February 27, 2011

abstract

A new company in the lithography world, SMEE has developed and produced a prototype wafer exposure tool, with an ArF laser light source. This tool, SMEE SSA600/10, adopted step and scan technology to obtain a large exposure filed and to average optical aberrations for a scanned image to improve CD uniformity and reduce distortion. The maximum numerical aperture is 0.75 and the maximum coherence factor of illumination system is 0.88. The illuminator provides continuously variable conventional and off-axis illumination modes to improve resolution. In this paper, the configuration of the exposure tool is presented and design concepts of the scanner are introduced. We show actual test data such as synchronization accuracy, focus and leveling repeatability, dynamic imaging performance (resolution, depth of focus) and overlay.

© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation

Lifeng Duan ; Jianrui Cheng ; Gang Sun and Yonghui Chen
"New 0.75 NA ArF scanning lithographic tool", Proc. SPIE 7973, Optical Microlithography XXIV, 79732D (March 22, 2011); doi:10.1117/12.879376; http://dx.doi.org/10.1117/12.879376


Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).

Figures

Tables

NOTE:
Citing articles are presented as examples only. In non-demo SCM6 implementation, integration with CrossRef’s "Cited By" API will populate this tab (http://www.crossref.org/citedby.html).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Advertisement


 

  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.