Paper
17 November 2010 Study on the polarization grating working in 1053-nm wavelength
Quan Liu, Peng Sun, Haibin Wang, Jianhong Wu
Author Affiliations +
Abstract
A fused-silica polarization grating at a wavelength of 1053 nm was designed. To achieve a high extinction ratio and efficiency, the grating profile was optimized by using rigorous coupled-wave analysis. The results showed: when the grating period, the duty cycle and the groove depth of polarization grating were at 650nm, 0.39 and 1340nm respectively, the extinction ratio could reach the maximum 34700; the efficiencies of the TE-polarized wave in the -1st order and the TM-polarized wave in the 0th order were 92.2% and 99.5% respectively. We also analyzed the effects of the deviations of the period and depth from optimized parameters on the extinction ratio and efficiency. The holographic lithography and the ion beam etching will be applied to fabricate a prototype polarization grating in late 2010.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Quan Liu, Peng Sun, Haibin Wang, and Jianhong Wu "Study on the polarization grating working in 1053-nm wavelength", Proc. SPIE 7848, Holography, Diffractive Optics, and Applications IV, 784838 (17 November 2010); https://doi.org/10.1117/12.871655
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KEYWORDS
Diffraction

Diffraction gratings

Polarization

Dielectric polarization

Etching

Ion beams

Holography

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