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The E-ReticleTM system was used to assess the electrostatic risks from mask manufacturing equipment
and processes. Test results showed that some mechanical operations of the equipment examined may
cause electrostatic potential differences in a production reticle higher than the ITRS recommended
specifications, which may bring electrostatic risks to the reticle.
E-ReticleTM data also indicated that the
processes play an important role in controlling electrostatic potentials in the reticle. The E-ReticleTM
system can be used as an in-situ equipment assessment tool, as well as a process optimization device.
Richard Tu andThomas Sebald
"Assessing equipment and process related electrostatic risks to reticles with E-ReticleTM system", Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77481C (26 May 2010); https://doi.org/10.1117/12.866487
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Richard Tu, Thomas Sebald, "Assessing equipment and process related electrostatic risks to reticles with E-Reticle system," Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77481C (26 May 2010); https://doi.org/10.1117/12.866487